• Software Development

    • Individual solutions to meet our customers' requirements
    • Many years of experience in major software projects
    • Extensive expertise in software technologies
    • Excellent references

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  • Equipment Control


    • Many years of experience in the control of high-tech devices from knitting machines through robots up to electron beam lithography
    • ePLACE® Mask Data Preparation Software

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  • Laboratory Automation

    • Individual software development for laboratory devices and equipment
    • SiLA-conform niceLAB scheduling software
    • SiLA-conform device drivers

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  • Transport & Logistics

    • Products for carrier, freight forwarders, transport providers or transport cooperation
    • Modern, user-friendly transport software for daily use
    • Software and IT services in the logistic sector
    • Individual software development to implement your requirements

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Equipment Control

Reference Projects

Before a company authorizes an external partner such as EQUIcon with the development of a software system which is important to the company, it is necessary to trust the capability and reliability of the partner. We would like to start this process of trust with our good and numerous references. On the other hand, our clients and partners almost always prefer that the solutions we draw up are not made public. For this reason we are only able to demonstrate a small but representative selection of our work.

PCI488-GPIB for OpenVMS

EQUIcon's GPIB implementation is based on the established TNT488 board from National Instruments and guarantees best-possible compatibility to the original IEQ11 and IEZ11 interfaces. PCI488 is currently the most frequently used GPIB interface for OpenVMS in the world.

PCI488 is available for the newest OpenVMS version, both for AXP and also IA64 architecture.

Download: PCI488 Spd 1.9 Product Description (PDF)

Equipment Control

EQUIcon Software GmbH Jena

Konrad-Zuse-Str. 2
07745 Jena

Telephone: +49 3641 6224 0
Fax: +49 3641 6224 11
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ePLACE-Sales

Telephone: +49 3641 6224 0
Fax: +49 3641 6224 11
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ePLACE-Support

Telephone: +49 3641 6224 55

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niceLAB-Sales

Telephone:+49 3641 6224 0
Fax: +49 3641 6224 11
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niceLAB-Support

elephone:+49 3641 6224 0

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User-Friendly User Interface

ePLACE depicts the complicated processes of data preparation in the simplest manner possible on the graphic user interface. Even the input is so flexible that even complex tasks can be compiled using the modular principle.

Scalability from Single PC up to Hundreds of CPUs in a Cluster

The client/server architecture enables distribution of compute-intensive tasks across several computers. The ePLACE routines may run in parallel across hundreds of CPUs, or on one single PC as well.

Layout Data Visualization

ePLACE provides many ways for data visualization. This includes display of input data, all intermediate results (including simulations results) right up to the electron beam writer shots.

Supported File Formats

The following file formats are supported by ePLACE:

  • OASIS
  • GDSII
  • DXF
  • CIF

Algorithms and Processes in ePLACE

ePLACE does not just fulfill the basic requirements of data preparation, but also provides the most modern technologies available which considerably increase the quality of the exposed patterns.

Modern Fracture Algorithm

The machine format mostly supports only rectangles, triangles, and trapezoids. The desired geometry has to be fractured into such figures. The fracture algorithm used in ePLACE plays a considerable role in the quality of the exposure.

  • Symmetrical fracture into X and Y trapezoids
  • Tool dependent fracture optimization for reduced shot count and write time.
  • Avoidance of sliver effects

Proximity Effect Correction with PROXECCO

A wide range of physical effects occurs during the electron beam exposure. For example, the beam is never perfectly focused. Electrons are scattered back. Chemical and thermal processes are induced in the resist layer on the substrate. The PROXECCO software - embedded in ePLACE - compensates such effects by local adaptation of the electron dose. PROXECCO is licensed by Vistec Electron Beam GmbH ( http://www.vistec-semi.com ).

  • Wide range of proximity functions
  • Optimized fracture into X and Y trapezoids reduces shot number and write time.
  • Line-end shortening correction and contrast enhancement (GIDC)

Patented GIDC Process for Contrast Improvement

With shrinking feature sizes the exposure contrast diminishes with serious consequences for exposure quality and stability. The GIDC technology (Geometrically Induced Dose Correction) increases the contrast such that even smaller structures can be exposed reliably.

  • Fewer defects
  • Lower edge roughness (LER/LWR)
  • Larger process window

Download: GIDC Flyer (PDF)

Physical Exposure Simulation

The defect susceptibility of an exposure can be forecast using physical simulations. This helps to avoid unnecessary exposures. Critical areas can be identified before exposure and adapted if necessary.

  • 2D and 3D visualization of simulation results
  • Forecasting of figure contours with LER/LWR simulation
  • Automatic simulation of thousands of measuring points per script with easy-to-view visualization of results

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